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|Title:||System development for laser writing lithography and holographic interference lithography||Authors:||Xu, Feng Lan.||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Microelectronics||Issue Date:||1997||Abstract:||Optoelectronic technology and optoelectronic integrated circuits (OEICs) are widely believed to be essential building blocks for the emerging information age. This has encouraged expanded research and development activities in this technology, which requires both flexible and low cost fabrication techniques. Among the various fabrication techniques, the maskless laser writing lithography technique is attractive due to its rapid prototyping capability, flexibility for different materials/processes, and low setup and running costs. The holographic interference lithographic technique is commonly used for the fabrication of diffraction gratings due to its simple configuration, low cost, and high uniformity.||URI:||http://hdl.handle.net/10356/19585||Rights:||NANYANG TECHNOLOGICAL UNIVERSITY||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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