Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/19585
Title: System development for laser writing lithography and holographic interference lithography
Authors: Xu, Feng Lan.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Issue Date: 1997
Abstract: Optoelectronic technology and optoelectronic integrated circuits (OEICs) are widely believed to be essential building blocks for the emerging information age. This has encouraged expanded research and development activities in this technology, which requires both flexible and low cost fabrication techniques. Among the various fabrication techniques, the maskless laser writing lithography technique is attractive due to its rapid prototyping capability, flexibility for different materials/processes, and low setup and running costs. The holographic interference lithographic technique is commonly used for the fabrication of diffraction gratings due to its simple configuration, low cost, and high uniformity.
URI: http://hdl.handle.net/10356/19585
Rights: NANYANG TECHNOLOGICAL UNIVERSITY
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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