Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/2733
Title: Ferroelectric thin films by RF sputtering technology
Authors: Zhu, Weiguang
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Issue Date: 2000
Abstract: A simple hydrogen interface-blocking model is discussed.
URI: http://hdl.handle.net/10356/2733
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Research Reports (Staff & Graduate Students)

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