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Title: A steady-state RF inductively coupled plasma source for plasma processing
Authors: Xu, Shuyan
Ahn, Jaeshin
Ostrikov, Kostyantyn
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2000
Abstract: This project aims at developing the low-frequency, uniform and high density plasma source for materials processing. The uniform, large (32 cm in diameter), high-density plasma source capable of rapid processign of large substrates has been developed and investigated both theoretically and experimentally.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Research Reports (Staff & Graduate Students)

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