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Title: Design and fabrication of an improved filtered cathodic vacuum ARC (FCVA) deposition system for tetrahedral amorphous carbon (TA-C) films
Authors: Tay, Beng Kang
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2001
Abstract: Various methods and apparatus have been developed for obtaining thin films or thin coatings. Films can be deposited by physical vapour deposition techniques and chemical vapour deposition techniques. Cathodic Vacuum Arc relates to the physical techniques, and which involves the use of positive ions generated from a cathodic arc source. The cathodic arc is a form of electrical discharge in vacuum, which is sustained in plasma, created by the arc alone and does not require the addition of an inert gas.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Research Reports (Staff & Graduate Students)

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