Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/2800
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dc.contributor.authorRusli.en_US
dc.date.accessioned2008-09-17T09:14:58Z-
dc.date.available2008-09-17T09:14:58Z-
dc.date.copyright2002en_US
dc.date.issued2002-
dc.identifier.urihttp://hdl.handle.net/10356/2800-
dc.description.abstractThis project aims to investigate the characteristics of a-C:H in two aspects, namely, its doping achieved by adding N2 B2H6 and PH3 to the hydrocarbon gas mixture during film growth and to characterize the plasma during the growth process through optical emission spectroscopy (OES) and Langmuir probe.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials-
dc.titleCharacterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applicationsen_US
dc.typeResearch Reporten_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.description.reportnumberRG 10/97-
item.grantfulltextrestricted-
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Appears in Collections:EEE Research Reports (Staff & Graduate Students)
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