Please use this identifier to cite or link to this item:
Title: Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications
Authors: Rusli.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Issue Date: 2002
Abstract: This project aims to investigate the characteristics of a-C:H in two aspects, namely, its doping achieved by adding N2 B2H6 and PH3 to the hydrocarbon gas mixture during film growth and to characterize the plasma during the growth process through optical emission spectroscopy (OES) and Langmuir probe.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Research Reports (Staff & Graduate Students)

Files in This Item:
File Description SizeFormat 
  Restricted Access
1.94 MBAdobe PDFView/Open

Page view(s) 50

Updated on May 14, 2021


Updated on May 14, 2021

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.