Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/2916
Title: Characterization of thin films by filtered cathodic vacuum arc technology
Authors: Lau, Daniel Shu Ping
Yu, Siu Fung
Tay, Beng Kang
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Issue Date: 2004
Abstract: Nanocomposite amorphous carbon (a-C:Me) films including a-C:Ni,a-C:Co,a-C:Ti,a-C:W,a-C:Fe,a-C:Al,anda-C:Si films were deposited using metal-carbon composite target by filtered cathodic vacuum arc (FCVA) technique. Atomic force microscopy(AFM), Raman, and X-ray photoelectron spectroscopy (XPS) were used to characterize themorphologyand structure ofthe films. Nanoindenter and surface profilometer were used to determine the hardness, Young's modulus, and internal stress. Contact angle and field emission experiments were used to study the surface energy and field emission properties of the films respectively. The influence of the type of elements and its composition in the target on the structural, mechanical, surface energy, and field emission properties were studied.
URI: http://hdl.handle.net/10356/2916
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Research Reports (Staff & Graduate Students)

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