Please use this identifier to cite or link to this item:
|Title:||Characterization of thin films by filtered cathodic vacuum arc technology||Authors:||Lau, Daniel Shu Ping
Yu, Siu Fung
Tay, Beng Kang
|Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials||Issue Date:||2004||Abstract:||Nanocomposite amorphous carbon (a-C:Me) films including a-C:Ni,a-C:Co,a-C:Ti,a-C:W,a-C:Fe,a-C:Al,anda-C:Si films were deposited using metal-carbon composite target by filtered cathodic vacuum arc (FCVA) technique. Atomic force microscopy(AFM), Raman, and X-ray photoelectron spectroscopy (XPS) were used to characterize themorphologyand structure ofthe films. Nanoindenter and surface profilometer were used to determine the hardness, Young's modulus, and internal stress. Contact angle and field emission experiments were used to study the surface energy and field emission properties of the films respectively. The influence of the type of elements and its composition in the target on the structural, mechanical, surface energy, and field emission properties were studied.||URI:||http://hdl.handle.net/10356/2916||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Research Reports (Staff & Graduate Students)|
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.