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https://hdl.handle.net/10356/3016| Title: | Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications | Authors: | Yoon, Soon Fatt. | Keywords: | DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics | Issue Date: | 1999 | Abstract: | Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications. | URI: | http://hdl.handle.net/10356/3016 | Schools: | School of Electrical and Electronic Engineering | Rights: | Nanyang Technological University | Fulltext Permission: | restricted | Fulltext Availability: | With Fulltext |
| Appears in Collections: | EEE Research Reports (Staff & Graduate Students) |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| EEE-RESEARCH-REPORT_73.pdf Restricted Access | 1.51 MB | Adobe PDF | View/Open |
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