Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3016
Title: Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
Authors: Yoon, Soon Fatt.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 1999
Abstract: Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.
URI: http://hdl.handle.net/10356/3016
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Research Reports (Staff & Graduate Students)

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