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|Title:||Plasma radiation sources for X-ray lithography and neutron analysis applications||Authors:||Lee, Sing
Wong, Terence Kin Shun
Lee, Paul Choon Keat
Springham, Stuart V.
Gribkov, Vladimir A.
Rajdeep Singh Rawat
|Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Microelectronics||Issue Date:||1999||Abstract:||The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications.||URI:||http://hdl.handle.net/10356/3020||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Research Reports (Staff & Graduate Students)|
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