Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3042
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dc.contributor.authorAhn, Jaeshinen_US
dc.date.accessioned2008-09-17T09:19:22Z
dc.date.available2008-09-17T09:19:22Z
dc.date.copyright2000en_US
dc.date.issued2000
dc.identifier.urihttp://hdl.handle.net/10356/3042
dc.description.abstractDevelopment of ion gun and ion beam etching and deposition system.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineeringen_US
dc.titleIon gun development/Ion beam etching and deposition system developmenten_US
dc.typeResearch Reporten_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.description.reportnumberRP 11/87
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Appears in Collections:EEE Research Reports (Staff & Graduate Students)
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