Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3044
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dc.contributor.authorLee, Singen_US
dc.contributor.authorWong, Terence Kin Shunen_US
dc.contributor.authorFeng, Xianpingen_US
dc.contributor.authorLee, Paul Choon Keaten_US
dc.contributor.authorSpringham, Stuart V.en_US
dc.contributor.authorSerban, Adrianen_US
dc.contributor.authorLiu, Maheen_US
dc.contributor.authorKudryashov, Vladimiren_US
dc.contributor.authorGribkov, Vladimir A.en_US
dc.contributor.authorRajdeep Singh Rawaten_US
dc.date.accessioned2008-09-17T09:19:24Z
dc.date.available2008-09-17T09:19:24Z
dc.date.copyright2000en_US
dc.date.issued2000
dc.identifier.urihttp://hdl.handle.net/10356/3044
dc.description.abstractTo demonstrate the soft x-ray source(SXR) developed and to gain experience in handling SXR masks and resists.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
dc.titleDemonstration lithography using plasma focus soft x-ray sourceen_US
dc.typeResearch Reporten_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.description.reportnumberRG 12/97
item.grantfulltextrestricted-
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Appears in Collections:EEE Research Reports (Staff & Graduate Students)
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