Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3149
Title: Formation of silicon nodules and the different methods of removing them
Authors: Chan, Ching Kok.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Issue Date: 2002
Abstract: Experiments have been done on the use of different metallization target, different metallization scheme and deposition temperature to characterize on the silicon nodule defect. This report summarizes on the investigation on the silicon precipitation problem.
URI: http://hdl.handle.net/10356/3149
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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