Please use this identifier to cite or link to this item:
|Title:||Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs||Authors:||Ranjan Khurana||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
|Issue Date:||2006||Abstract:||This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements.||URI:||http://hdl.handle.net/10356/3176||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.