Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3176
Title: Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
Authors: Ranjan Khurana
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Issue Date: 2006
Abstract: This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements.
URI: http://hdl.handle.net/10356/3176
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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