Please use this identifier to cite or link to this item:
Title: Design of high quality factor inductor on silicon
Authors: Tan, Hai Peng.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2000
Abstract: The purpose of this project is to introduce an IC inductor of high quality factor performance on silicon substrate using conventional CMOS or BiCMOS technologies. The thesis conducts a comprehensive study on the conventional rectangular spiral inductors for different numbers of turns using both the experimental measurements and numerical simulations. Several numbers of spiral inductors were simulated with different metal widths. An investigation on the widths to maximize the quality factor of an inductor was performed.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

Files in This Item:
File Description SizeFormat 
  Restricted Access
9.51 MBAdobe PDFView/Open

Page view(s)

Updated on May 14, 2021


Updated on May 14, 2021

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.