Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3399
Title: Properties of amorphous Si-carbon alloy film deposited by FCVA technique
Authors: Tan, Wee Ming
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Issue Date: 2003
Abstract: Amorphous silicon-carbon alloy (a-Sii-xCx) has attracted much attention not only due to the composition dependent variability of their optical band gap but also because of their important roles as intermediate layer for the growth of diamond film on crystalline silicon and non-diamond substrates. [1]
URI: http://hdl.handle.net/10356/3399
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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