Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3424
Title: Characterization of deep trench etch recipe
Authors: Tay, Chin Tiong.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Issue Date: 2003
Abstract: This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconductor Foundry. The DOE results will be used for: · Fine-tuning of parameters to achieve desired trench profile · Troubleshooting on any drift in the input parameters · Future development of similar processes that required deep trench · Further improvement of the deep trench recipes
URI: http://hdl.handle.net/10356/3424
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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