Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3426
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dc.contributor.authorCheah, Li Kang.en_US
dc.date.accessioned2008-09-17T09:29:55Z-
dc.date.available2008-09-17T09:29:55Z-
dc.date.copyright1999en_US
dc.date.issued1999-
dc.identifier.urihttp://hdl.handle.net/10356/3426-
dc.description.abstractThe filtered cathodic vacuum arc (FCVA) technique has proved to be a promising method for deposition of high quality and large uniformity tetrahedral amorphous carbon (ta-C) films on different substrate materials at room temperature. Our study shows that the predominant factor to determine the sp content in the film is the carbon ion energy and the deposition rate. About 88 % of the carbon atoms in the ta-C film deposited with the optimum condition are tetrahedrally bonded which is the same bonding structure as diamond.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials-
dc.titleFabrication and characterization of tetrahedral amorphous carbon films for some applicationsen_US
dc.typeThesisen_US
dc.contributor.supervisorShi, X.en_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.description.degreeDoctor of Philosophy (EEE)en_US
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