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      Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique

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      EEE-THESES_1297.pdf (2.822Mb)
      Author
      Yu, Ting
      Date of Issue
      2005
      School
      School of Electrical and Electronic Engineering
      Abstract
      There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematically investigated for potential electronic device applications.
      Subject
      DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
      DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
      Type
      Thesis
      Rights
      Nanyang Technological University
      Collections
      • Theses and Dissertations (Submission before August 2018)
      https://doi.org/10.32657/10356/3434
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