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|Title:||Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique||Authors:||Yu, Ting||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
|Issue Date:||2005||Source:||Yu, T. (2005). Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique. Doctoral thesis, Nanyang Technological University, Singapore.||Abstract:||There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematically investigated for potential electronic device applications.||URI:||https://hdl.handle.net/10356/3434||DOI:||10.32657/10356/3434||Rights:||Nanyang Technological University||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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