Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
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Author
Yu, Ting
Date of Issue
2005School
School of Electrical and Electronic Engineering
Abstract
There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematically investigated for potential electronic device applications.
Subject
DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Type
Thesis
Rights
Nanyang Technological University
https://doi.org/10.32657/10356/3434
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