Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3434
Title: Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
Authors: Yu, Ting
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2005
Source: Yu, T. (2005). Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematically investigated for potential electronic device applications.
URI: https://hdl.handle.net/10356/3434
DOI: 10.32657/10356/3434
Rights: Nanyang Technological University
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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