Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3506
Title: Characterization and modeling of on-wafer interconnects for RFICs
Authors: Shi, Xiaomeng
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Issue Date: 2007
Source: Shi, X. (2007). Characterization and modeling of on-wafer interconnects for RFICs. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: This thesis addresses the characterization and modeling of on-wafer interconnects for CMOS RFICs. A scalable equivalent circuit model for complex-shaped interconnects is proposed. In this proposed structure, frequency-variant characteristics are modeled by frequency independent components. Therefore, the proposed model is compatible with commercial electronic design automation (EDA) tools. The accuracy of the model is verified with on-wafer measurements. Moreover, the proposed model is employed in the post-layout simulation of a real circuit. The simulated and measured figures of merit (FoM) of the circuit are compared and analyzed. The proposed model demonstrates higher accuracy than the foundry provided model. Also addressed in this thesis is the sensitivities of interconnects to CMOS process parameters.
URI: https://hdl.handle.net/10356/3506
DOI: 10.32657/10356/3506
Schools: School of Electrical and Electronic Engineering 
Rights: Nanyang Technological University
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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