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|Title:||Prediction of temperature offsets in the epitaxy process||Authors:||Yang, Xuan Wei||Keywords:||DRNTU::Engineering::Manufacturing||Issue Date:||2007||Abstract:||This research analyzes and evaluates the use of neural networks as a forecasting tool. Specifically a neural network's ability to predict the temperature offsets is tested. Temperature offsets are important control parameters in the semiconductor process. In the research, the neural network with back propagation learning algorithm is chosen to predict the temperature offsets based on the past observation. The prediction accuracy is compared against several forecasting methods, like multiple regression mode and radial basis function network.||Description:||92 p.||URI:||http://hdl.handle.net/10356/36046||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||MAE Theses|
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