Synthesis, characterisation and device application of silicon nanocrystals
Ng, Chi Yung
Date of Issue2007
School of Electrical and Electronic Engineering
It is the intent of this work to investigate the physics and device applications of silicon nanocrystals embedded in dielectric film. Silicon nanocrystals embedded in Si02 film have been synthesized using ion-implantation. Metal-oxide-semiconductor field-effect-transistors (MOSFET) embedded with silicon nanocrystal as charge storage node has also been fabricated. The electrical characteristics of the structure are obtained using the conventional current-voltage (I-V) and capacitance-voltage (C-V) techniques. To identify the size of the silicon nanocrystal, X-ray Diffraction (XRD) and cross-section Transmission Electron Microscopy (TEM) measurements have been conducted.
DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics