Plasma immersion ion implantation on polymers
Sze, Jia Yin
Date of Issue2007
School of Electrical and Electronic Engineering
The focus of this thesis is to achieve plasma based surface modification of polymers. Highly ionized carbon plasma was generated from a filtered cathodic arc source in a vacuum chamber. The use of a highly negative pulse voltage applied on the substrate holder formed a plasma sheath around the substrate holder during the on-pulse. Ions were accelerated in the plasma sheath towards the polymer, thus creating the process: plasma immersion ion implantation (PHI). In this process, ions were implanted up to a depth of about 50 nm and with pulse voltages of between 3 kV and 12 kV. Ion-solids interactions provided both physical and chemical modifications to the modified layer.
DRNTU::Engineering::Electrical and electronic engineering