Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/39058
Title: Plasma immersion ion implantation on polymers
Authors: Sze, Jia Yin
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2007
Source: Sze, J. Y. (2007). Plasma immersion ion implantation on polymers. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: The focus of this thesis is to achieve plasma based surface modification of polymers. Highly ionized carbon plasma was generated from a filtered cathodic arc source in a vacuum chamber. The use of a highly negative pulse voltage applied on the substrate holder formed a plasma sheath around the substrate holder during the on-pulse. Ions were accelerated in the plasma sheath towards the polymer, thus creating the process: plasma immersion ion implantation (PHI). In this process, ions were implanted up to a depth of about 50 nm and with pulse voltages of between 3 kV and 12 kV. Ion-solids interactions provided both physical and chemical modifications to the modified layer.
Description: 158 p.
URI: https://hdl.handle.net/10356/39058
DOI: 10.32657/10356/39058
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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