Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/39143
Title: Development and optimization of 1.2 micron CMOS process technology
Authors: Arati Majumder
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2007
Abstract: This project was aimed to study and optimize the baseline 1.2um Twin-Well CMOS technology, keeping in view the future application of this process to the 1.2um SiGe BiCMOS technology.
Description: 152 p.
URI: http://hdl.handle.net/10356/39143
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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