Please use this identifier to cite or link to this item:
Title: Development and optimization of 1.2 micron CMOS process technology
Authors: Arati Majumder
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2007
Abstract: This project was aimed to study and optimize the baseline 1.2um Twin-Well CMOS technology, keeping in view the future application of this process to the 1.2um SiGe BiCMOS technology.
Description: 152 p.
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

Files in This Item:
File Description SizeFormat 
  Restricted Access
Main report18.35 MBAdobe PDFView/Open

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.