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|Title:||Design and fabrication of surface micromachined microbolometer for IR image sensor||Authors:||Yuan, Xiaohong.||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Electronic circuits||Issue Date:||2002||Abstract:||In this thesis, the integration of CMOS devices with microbolometer on the same silicon chip was studied. Silicon based materials Poly-Si and Poly-SiGe layers were deposited as the sensor films as well as the CMOS gate electrode. Microbolometer test structures and CMOS devices were fabricated using separately process flows.||URI:||http://hdl.handle.net/10356/3916||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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