Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams

Abstract

In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant distances, in our configuration, in excess of 20 cm.