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|Title:||Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams||Authors:||Zhang, Lesheng||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging||Issue Date:||2005||Abstract:||In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant distances, in our configuration, in excess of 20 cm.||URI:||http://hdl.handle.net/10356/3982||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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