Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/3982
Title: Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
Authors: Zhang, Lesheng
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Issue Date: 2005
Abstract: In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant distances, in our configuration, in excess of 20 cm.
URI: http://hdl.handle.net/10356/3982
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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