Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4026
Title: Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
Authors: Chen, Yuwen.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Issue Date: 2002
Abstract: This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs).
URI: http://hdl.handle.net/10356/4026
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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