Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4033
Title: Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
Authors: Zhao, Zhiwei
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2005
Source: Zhao, Z. W. (2005). Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties.
URI: https://hdl.handle.net/10356/4033
DOI: 10.32657/10356/4033
Rights: Nanyang Technological University
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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