Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/4033
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Zhao, Zhiwei | en |
dc.date.accessioned | 2008-09-17T09:42:59Z | en |
dc.date.available | 2008-09-17T09:42:59Z | en |
dc.date.copyright | 2005 | en |
dc.date.issued | 2005 | en |
dc.identifier.citation | Zhao, Z. W. (2005). Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications. Doctoral thesis, Nanyang Technological University, Singapore. | en |
dc.identifier.uri | https://hdl.handle.net/10356/4033 | en |
dc.description.abstract | This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties. | en |
dc.rights | Nanyang Technological University | en |
dc.subject | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials | en |
dc.subject | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films | en |
dc.title | Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications | en |
dc.type | Thesis | en |
dc.contributor.supervisor | Tay Beng Kang | en |
dc.contributor.school | School of Electrical and Electronic Engineering | en |
dc.description.degree | DOCTOR OF PHILOSOPHY (EEE) | en |
dc.identifier.doi | 10.32657/10356/4033 | en |
item.fulltext | With Fulltext | - |
item.grantfulltext | open | - |
Appears in Collections: | EEE Theses |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
EEE-THESES_1836.pdf | 13.67 MB | Adobe PDF | View/Open |
Page view(s) 50
431
Updated on Mar 28, 2024
Download(s) 20
250
Updated on Mar 28, 2024
Google ScholarTM
Check
Altmetric
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.