dc.contributor.authorZhao, Zhiweien_US
dc.date.accessioned2008-09-17T09:42:59Z
dc.date.accessioned2017-07-23T08:31:35Z
dc.date.available2008-09-17T09:42:59Z
dc.date.available2017-07-23T08:31:35Z
dc.date.copyright2005en_US
dc.date.issued2005
dc.identifier.citationZhao, Z. W. (2005). Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications. Doctoral thesis, Nanyang Technological University, Singapore.
dc.identifier.urihttp://hdl.handle.net/10356/4033
dc.description.abstractThis study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
dc.subjectDRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
dc.titleGrowth and characterization of oxide thin films by filtered cathodic vacuum arc and their applicationsen_US
dc.typeThesisen_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.contributor.supervisorTay Beng Kangen_US
dc.description.degreeDOCTOR OF PHILOSOPHY (EEE)en_US


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