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|Title:||Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides||Authors:||Rajni||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
|Issue Date:||2008||Source:||Rajni. (2008). Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides. Doctoral thesis, Nanyang Technological University, Singapore.||Abstract:||Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosilicate films has been investigated. The values of ?n increases with UV-illumination time, and saturated at ~ 0.0094 in case of densified thin films (~ 200 nm), and at ~ 0.005 in case of thick films (~ 3 µm). This high value of ?n is attributed to the creation of oxygen deficiency, and found to be high enough to form optical guiding channel. Photonic waveguide devices such as channel-waveguides, optical splitters and switches have been successfully fabricated using the DUI technique and the results are found to be in good agreement with the theoretical results.||URI:||https://hdl.handle.net/10356/4113||DOI:||10.32657/10356/4113||Rights:||Nanyang Technological University||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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