Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/41444
Title: Application of carbon nanotubes (CNTS) in copper/low k interconnects design
Authors: Loo, Shane Zhi Yuan
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
DRNTU::Engineering::Nanotechnology
Issue Date: 2008
Source: Loo, S. Z. Y. (2008). Application of carbon nanotubes (CNTS) in copper/low k interconnects design. Master’s thesis, Nanyang Technological University, Singapore.
Abstract: With continuing device scaling from a 90nm to a 65nm node, wiring interconnect becomes increasingly crucial due to the effects on electrical resistance and wiring capacitance. The electrical resistance and parasitic capacitance associated with these metal interconnections has become a major factor that limits the circuit speed of such high performance IC's. This limitation is one of the motivating factor for microelectronics industry's move away from aluminium/silicon dioxide interconnects to Cu and low-k dielectrics material systems.
URI: https://hdl.handle.net/10356/41444
DOI: 10.32657/10356/41444
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MAE Theses

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