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https://hdl.handle.net/10356/4193| Title: | Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD | Authors: | Cui, Jie. | Keywords: | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials | Issue Date: | 2001 | Abstract: | In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films. | URI: | http://hdl.handle.net/10356/4193 | Schools: | School of Electrical and Electronic Engineering | Rights: | Nanyang Technological University | Fulltext Permission: | restricted | Fulltext Availability: | With Fulltext |
| Appears in Collections: | EEE Theses |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| EEE-THESES_252.pdf Restricted Access | 2.38 MB | Adobe PDF | View/Open |
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