Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4277
Title: Preparation and characterization of amorphous SiCN films
Authors: Gao, Ying.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2001
Abstract: In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films.
URI: http://hdl.handle.net/10356/4277
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

Files in This Item:
File Description SizeFormat 
EEE-THESES_328.pdf
  Restricted Access
1.76 MBAdobe PDFView/Open

Google ScholarTM

Check

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.