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Title: Preparation and characterization of amorphous SiCN films
Authors: Gao, Ying.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2001
Abstract: In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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