Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4303
Title: Analysis of mesoporous ultra low K dielectric materials for microelectronic interconnects
Authors: Goh, Tat Kean.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2004
Abstract: The project analysed the mesoporous ultra low K dielectric materials for microelectronic interconnects.
URI: http://hdl.handle.net/10356/4303
Schools: School of Electrical and Electronic Engineering 
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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