Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/43680
Title: Preparation of silicon quantum dots
Authors: Lim, Wei Xiang.
Keywords: DRNTU::Engineering::Materials::Nanostructured materials
Issue Date: 2011
Abstract: Silicon nanoparticle, typically when in the quantum dot region of less than 10nm, demonstrated unique properties in optical, electrical as well as catalytic properties. The Silicon nanoparticle has been proposed as a potential photocatalyst due to its relatively small band gap. It allows excitation from wavelength that surpasses current catalyst. It has been shown that when Silicon nanoparticles are suspended in water under UV light, the nanoparticles will undergo photo-oxidation and generate hydrogen.[1] In this project however we are focusing on method of synthesizing the Silicon nanoparticle using two different method, namely chemical reduction method and etching method. We would investigate the Silicon nanoparticles synthesize by the different methods and compare the nanoparticles forms.
URI: http://hdl.handle.net/10356/43680
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MSE Student Reports (FYP/IA/PA/PI)

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