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https://hdl.handle.net/10356/4397| Title: | Deposition and characterization of metal-containing carbon (Me-c:h) films | Authors: | Huang, Qingfeng. | Keywords: | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials | Issue Date: | 2002 | Abstract: | The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films. | URI: | http://hdl.handle.net/10356/4397 | Schools: | School of Electrical and Electronic Engineering | Rights: | Nanyang Technological University | Fulltext Permission: | restricted | Fulltext Availability: | With Fulltext |
| Appears in Collections: | EEE Theses |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| EEE-THESES_435.pdf Restricted Access | 5.1 MB | Adobe PDF | View/Open |
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