Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4397
Title: Deposition and characterization of metal-containing carbon (Me-c:h) films
Authors: Huang, Qingfeng.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2002
Abstract: The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films.
URI: http://hdl.handle.net/10356/4397
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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