Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4461
Title: Development of silicon carbide thin films for optoelectronic device applications
Authors: Ji, Rong
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 1996
Abstract: In this project, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been used to deposit amorphous (a-SiC:H) and microcrystalline (mc-SiC3-I) films for characterisation of their optical, electrical and structural properties using transmittance/reflectance measurements, variable-temperature current-voltage (I-V) characterisation, Raman scattering and Fourier transform IR spectroscopy.
URI: http://hdl.handle.net/10356/4461
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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