Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/44781
Title: Photoresists based on urethane acrylate mixed with fluoroacrylates
Authors: Chong, Joseph Rui Hong.
Keywords: DRNTU::Engineering::Materials
Issue Date: 2011
Abstract: Roll-to-roll UV embossing is a field with large commercial applications. This is due to the large amount of devices these days that necessitate the use of display technologies, which are highly dependent on the use of optical substrates. UV curing provide significant advantages in terms of large scale production, quick processing and low costs. In this report, a kinetics study was done on the curing of siliconized urethane acrylates, CN990 mixed with either 2,2,2-Trifluoroethyl acrylate(TFEA) or 2,2,3,3-Tetrafluoropropyl acrylate(TFPA) in varying ratios from 100:0, 90:10 to 0:100. A photoinitiator, Darocur® 1173, was added at 4wt% to the formulation. Experiments were done on the photo-differential scanning calorimetry(DPC) at different temperatures, and analysis of the results were done using Thermal Advantage® Specialty Library software. Analysis showed that for both formulations, the reaction rate increases as the ratio of monomer increases, up till around 70:30. The maximal reaction rate at 40 °C was also observed.
URI: http://hdl.handle.net/10356/44781
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MSE Student Reports (FYP/IA/PA/PI)

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