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|Title:||Characterization and fabrication of InGaN/GaN MQWs and LEDs on macroporous Si substrate||Authors:||Dang, Dominic Thor Weng||Keywords:||DRNTU::Engineering::Electrical and electronic engineering||Issue Date:||2011||Abstract:||Growth of indium gallium nitrite (InGaN)/gallium nitride (GaN) multiple quantum well (MQW) on porous silicon (Si) and porous GaN on sapphire had been studied. Electrochemical etching was carried out to produce the porous surfaces. Effects of current, temperature, illumination and durations on electrochemical etching were investigated. Material properties and performance of light emitting diodes (LEDs) grown on porous Si and conventional substrates were compared. Characterizations results from scanning electron microscope (SEM), transmission electron microscope (TEM), reciprocal space map (RSM) and micro-photoluminescence (micro-PL) shows that MQW grown on porous Si were less stressed. Significant improvement of 6-8 times was observed on the PL intensity of MQW grown on porous Si.||URI:||http://hdl.handle.net/10356/45004||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Student Reports (FYP/IA/PA/PI)|
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