Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4545
Title: Impact of spike anneal on ultra shallow junction formation
Authors: Lai, Chung Woh
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Issue Date: 2002
Abstract: This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.
URI: http://hdl.handle.net/10356/4545
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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