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Title: Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
Authors: Lee, Yi Chau.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Issue Date: 2004
Abstract: In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.
Schools: School of Electrical and Electronic Engineering 
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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