Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/4588| Title: | Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films | Authors: | Lee, Yi Chau. | Keywords: | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials | Issue Date: | 2004 | Abstract: | In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials. | URI: | http://hdl.handle.net/10356/4588 | Schools: | School of Electrical and Electronic Engineering | Rights: | Nanyang Technological University | Fulltext Permission: | restricted | Fulltext Availability: | With Fulltext |
| Appears in Collections: | EEE Theses |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| EEE-THESES_607.pdf Restricted Access | 4.66 MB | Adobe PDF | View/Open |
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.