Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4597
Title: Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP
Authors: Leong, Daniel Woon Loong.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 2003
Abstract: In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.
URI: http://hdl.handle.net/10356/4597
Schools: School of Electrical and Electronic Engineering 
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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