Please use this identifier to cite or link to this item:
Title: Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP
Authors: Leong, Daniel Woon Loong.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 2003
Abstract: In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.
Schools: School of Electrical and Electronic Engineering 
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

Files in This Item:
File Description SizeFormat 
  Restricted Access
2.55 MBAdobe PDFView/Open

Page view(s) 50

Updated on Jun 18, 2024


Updated on Jun 18, 2024

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.