Please use this identifier to cite or link to this item:
|Title:||Application of low frequency noise in the study of VLSI electromigration||Authors:||Lim, Shin Yeh.||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Microelectronics||Issue Date:||2002||Abstract:||The objective of this project are I) to propose a systematic procedure of low-frequency noise measurement analysis to ensure the validation of the obtained result and its conclusion. Ii) to study the possible electromigration noise source among various diffusion paths of electromigration fluxes.||URI:||http://hdl.handle.net/10356/4688||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.