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|Title:||Investigation of nano-porous silicon fabricated by electrochemical etching||Authors:||Ong, June Lay Ting||Keywords:||DRNTU::Engineering::Electrical and electronic engineering||Issue Date:||2011||Abstract:||Porous silicon is quickly becoming an increasingly important and versatile electronic material in today's fabrication technology. Nowadays, because of its high reactivity due to its large surface area of the pores, porous silicon has been demonstrated as a useful sacrificial layer in surface micro machining. It's unique morphology made it an attractive material for the fabrication of the chemical sensing microstructures. It is also being use as planar emitters for efficient emission of electrons. In addition, porous silicon serves as a good substrate material for both the carbon nanotube material for the enhancement of the field emission property.||Description:||72 p.||URI:||http://hdl.handle.net/10356/46890||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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