Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/4740
Title: Influence of cleaning process on gate oxide integrity
Authors: Liu, Qing Guang.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Issue Date: 2003
Abstract: The influence of cleaning process on GOI (Gate Oxide Integrity) is studied in the whole FEOL (Front End Of the Line) process loop.
URI: http://hdl.handle.net/10356/4740
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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