Please use this identifier to cite or link to this item:
Title: Plasma soft X-ray source for microelectronic lithography
Authors: Zhang, Gui Xin
Keywords: DRNTU::Science
Issue Date: 2011
Abstract: Two different compact Plasma Focus (PF) devices — NNSX1 and NNSX2 were set up and developed as plasma soft x-ray sources for microelectronic lithography. This thesis reports investigation of soft x-ray emission from the plasma focus. Experiments were carried out under various experimental conditions, such as different configurations of PF chambers, different anode lengths, different initial neon pressures, different charging voltages, different polarities of central electrode as well as different repetition rates.
Description: 266 p.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Theses

Files in This Item:
File Description SizeFormat 
  Restricted Access
31.13 MBAdobe PDFView/Open

Page view(s) 10

checked on Oct 26, 2020

Download(s) 10

checked on Oct 26, 2020

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.