Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/47512
Title: Plasma soft X-ray source for microelectronic lithography
Authors: Zhang, Gui Xin
Keywords: DRNTU::Science
Issue Date: 2011
Abstract: Two different compact Plasma Focus (PF) devices — NNSX1 and NNSX2 were set up and developed as plasma soft x-ray sources for microelectronic lithography. This thesis reports investigation of soft x-ray emission from the plasma focus. Experiments were carried out under various experimental conditions, such as different configurations of PF chambers, different anode lengths, different initial neon pressures, different charging voltages, different polarities of central electrode as well as different repetition rates.
Description: 266 p.
URI: http://hdl.handle.net/10356/47512
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Theses

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