Plasma soft X-ray source for microelectronic lithography

Abstract

Two different compact Plasma Focus (PF) devices — NNSX1 and NNSX2 were set up and developed as plasma soft x-ray sources for microelectronic lithography. This thesis reports investigation of soft x-ray emission from the plasma focus. Experiments were carried out under various experimental conditions, such as different configurations of PF chambers, different anode lengths, different initial neon pressures, different charging voltages, different polarities of central electrode as well as different repetition rates.