Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/47512
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dc.contributor.authorZhang, Gui Xinen_US
dc.date.accessioned2011-12-27T08:31:44Z
dc.date.available2011-12-27T08:31:44Z
dc.date.issued2011
dc.identifier.urihttp://hdl.handle.net/10356/47512
dc.description266 p.en_US
dc.description.abstractTwo different compact Plasma Focus (PF) devices — NNSX1 and NNSX2 were set up and developed as plasma soft x-ray sources for microelectronic lithography. This thesis reports investigation of soft x-ray emission from the plasma focus. Experiments were carried out under various experimental conditions, such as different configurations of PF chambers, different anode lengths, different initial neon pressures, different charging voltages, different polarities of central electrode as well as different repetition rates.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Scienceen_US
dc.titlePlasma soft X-ray source for microelectronic lithographyen_US
dc.typeThesisen_US
dc.contributor.supervisorLee Singen_US
dc.contributor.schoolSchool of Physical and Mathematical Sciencesen_US
dc.description.degree​Doctor of Philosophy (SPMS)en_US
dc.contributor.supervisor2Feng Xianping
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