Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/49550
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dc.contributor.authorWong, Qihao.
dc.date.accessioned2012-05-21T09:08:35Z
dc.date.available2012-05-21T09:08:35Z
dc.date.copyright2012en_US
dc.date.issued2012
dc.identifier.urihttp://hdl.handle.net/10356/49550
dc.description.abstractStrain accelerated HF etching is a process which allows for the separation of an intermediate layer in an aqueous acidic solution. The key idea behind this etching method is to induce tensile strain on the material which will subsequently improve the rate of etching. The initial stage of this project requires the student to search and purchase an ideal stepper motor which meets the specific requirement to induce sufficient strain on the intermediate layer. Upon purchase, the student has to understand the device and program the device‘s function to meet the requirements of the experiment. On top of that, the student will implement the device into the experiment, and study the effects it has on the results.en_US
dc.format.extent75 p.en_US
dc.language.isoenen_US
dc.rightsNanyang Technological University
dc.subjectDRNTU::Engineering::Electrical and electronic engineering::Semiconductorsen_US
dc.titleCharacterization of semiconductor heterostructuresen_US
dc.typeFinal Year Project (FYP)en_US
dc.contributor.supervisorYoon Soon Fatten_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.description.degreeBachelor of Engineeringen_US
item.grantfulltextrestricted-
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Appears in Collections:EEE Student Reports (FYP/IA/PA/PI)
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FYP A6154-111 FINAL REPORT (WONG QIHAO, SETH).pdf
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