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|Title:||Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters||Authors:||Ong, Eunice Ho Hui.||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging||Issue Date:||2005||Abstract:||This project is carried out with the main purpose of improving line-width uniformity and deviation across each wafer through optimization of the photolithography processes. In order to remain price competitive in the chip market, this project is also aimed at reducing production costs.||URI:||http://hdl.handle.net/10356/4999||Rights:||Nanyang Technological University||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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