Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5054
Title: Surface chemical study on the oxidation resistance of plasma-treated copper
Authors: Wong, Andrew See Weng.
Keywords: DRNTU::Engineering::Materials::Plasma treatment
Issue Date: 2000
Abstract: In this article, we have also demonstrated the use of XPS, AES, FTIR, RS, XRD, TEM, FE-SEM for studying copper oxidation and, for the first time, studied the surface chemistry and oxidation-resistance of the C, N and Cu-containing films.
URI: http://hdl.handle.net/10356/5054
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MSE Theses

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